INVESTIGATION OF INTERFACIAL STRUCTURES OF NANOSCALE T i N/A l NMULTILAYER BY NEUTRON AND X RAY REFLECTOMETRY

摘要

Neutron reflectometry allows to characterize surfaces and interfaces of ultra thin filmlayered systems down to a nanometric scale ( (～ 2 nm). It can provide awealth of information on thickness, structure and interfacial properties in nanometer lengthscale. Combination of neutr on and X ray reflect ometry is well suited for obtainingphysical parameters of nanostructured superlattice films. In the present work nano scaleTiN/AlN multilayers with different modulation period and modulation ratio werefabricated using reactive magne tron sputtering. N eutron and X ray reflectometry methodswere used to study interface structures of multilayers . The results show that the TiN/AlNmultilayers with different modulation period and fixed modulation ratio are typicalspuerlattice films and have sharp interface between TiN and AlN layers. However, forTiN/AlN multilayers with variable modulation ratio there is the diffusion interface. It isexplained that a coherent interface structure is formed in TiN/AlN multilayers, in which the metastable cubic AlN layer with the thickness of 2 nm forms as a result of the template effect of cubic TiN.