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首页> 外文期刊>Journal of Experimental Physics >Electrical Switching in Thin Film Structures Based on Molybdenum Oxides
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Electrical Switching in Thin Film Structures Based on Molybdenum Oxides

机译:基于氧化钼的薄膜结构中的电开关

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We report on the experimental study of electrical instabilities in thin film structures on the basis of molybdenum oxides. Thin films of molybdenum oxide are obtained by thermal vacuum evaporation and anodic oxidation. The results of X-ray structural analysis, investigation of optical and electrical properties, are presented. It is shown that the initial vacuum-deposited oxide represents amorphous MoO3. In the MOM (metal-oxide-metal) structures with Mo oxide films obtained by the two methods, the effect of electrical switching with an S-shaped current-voltage characteristic is found. We put forward a hypothesis according to which the switching mechanism is associated with the development of electrical instability caused by the insulator-to-metal transition in Mo8O23. The switching channel, comprising this lower valence oxide, emerges in the initial film during the process of electrical forming of the MOM structure. The obtained results indicate the possibility of application of these structures in oxide micro- and nanoelectronics as electronic switches and other electronic devices.
机译:我们报告了基于氧化钼的薄膜结构中电不稳定性的实验研究。通过热真空蒸发和阳极氧化获得氧化钼薄膜。介绍了X射线结构分析,光学和电学性质的研究结果。结果表明,最初的真空沉积氧化物代表非晶态的MoO3。在通过两种方法获得的具有Mo氧化物膜的MOM(金属-氧化物-金属)结构中,发现了具有S形电流-电压特性的电开关的效果。我们提出了一个假设,根据该假设,开关机制与Mo8O23中绝缘体向金属的过渡引起的电不稳定性的发展有关。在MOM结构的电形成过程中,包括该低价氧化物的开关通道出现在初始膜中。获得的结果表明了将这些结构应用于氧化物微电子和纳米电子作为电子开关和其他电子设备的可能性。

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