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METHOD FOR MANUFACTURING MOLYBDENUM OXIDE-CONTAINING THIN FILM STARTING MATERIAL FOR FORMING MOLYBDENUM OXIDE-CONTAINING THIN FILM AND MOLYBDENUM AMIDE COMPOUND
METHOD FOR MANUFACTURING MOLYBDENUM OXIDE-CONTAINING THIN FILM STARTING MATERIAL FOR FORMING MOLYBDENUM OXIDE-CONTAINING THIN FILM AND MOLYBDENUM AMIDE COMPOUND
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机译:制造含氧化钼的薄膜起始材料的方法,用于形成含氧化钼的薄膜和酰胺钼的化合物
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摘要
The present invention relates to a process for producing a thin film, which comprises introducing a vapor containing a molybdenum compound obtained by vaporizing a thin film forming raw material containing a compound represented by the following general formula (I) into a gas phase and introducing an oxidizing gas to decompose and / And reacting the molybdenum oxide to form a thin film on the substrate. Wherein, R 1, R 2 denotes a straight-chain or branched alkyl group having a carbon number of 1 ~ 4, R 3 represents a t- butyl or t- amyl, y represents 0 or 2, x is y is zero And when y is 2, R 1 and R 2 which are present may be the same or different.
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