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首页> 外文期刊>Journal of Applied Research and Technology >Nanocolumnar CdS thin films grown by glancing angle deposition from a sublimate vapor effusion source
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Nanocolumnar CdS thin films grown by glancing angle deposition from a sublimate vapor effusion source

机译:通过升华蒸汽喷射源通过掠射角沉积生长的纳米柱CdS薄膜

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Abstract The glancing angle deposition (GLAD) technique was used to grow cadmium sulfide (CdS) thin films on glass and indium tin oxide (ITO)-coated glass substrates from a sublimate vapor effusion source. The samples were prepared under different incident deposition flux angles (α) of 0o, 20o and 80o, while both the substrate and the source were under rotation. The temperature of the source was 923.15 K. Scanning electron microscopy images showed that the GLAD method combined with the source produced dense nanocolumnar structures with height and diameters of ~200 and~30 nm, respectively. The deposited films displayed a hexagonal structure with preferential (002) plane orientation and crystallites sizes between~25 nm and ~35 nm. A maximum solar weighted transmission of ~92% was obtained for the sample prepared at α = 80o, with a substrate/sourcerotation velocity ratio of 55/20 in the wavelength region of 400-900 nm. The average band-gap energy of the films was ~2.42 eV. Refractive indexes between ~1.4 and ~2.4 at a 550 nm the wavelength was also obtained.
机译:摘要掠射角沉积(GLAD)技术用于从升华蒸气散发源在玻璃和铟锡氧化物(ITO)涂层玻璃基板上生长硫化镉(CdS)薄膜。在衬底和源都旋转的情况下,以0o,20o和80o的不同入射沉积通量角(α)制备样品。离子源的温度为923.15K。扫描电子显微镜图像显示,GLAD方法与离子源结合可产生致密的纳米柱状结构,其高度和直径分别为〜200和〜30 nm。沉积的薄膜显示出具有优先(002)平面取向的六边形结构,微晶尺寸在〜25 nm至〜35 nm之间。对于以α= 80o制备的样品,在400-900 nm的波长范围内,底物/源旋转速度比为55/20,获得的最大太阳加权透射率为〜92%。薄膜的平均带隙能为〜2.42 eV。在波长为550 nm时,折射率也在〜1.4和〜2.4之间。

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