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首页> 外文期刊>Journal of Advanced Science >めっき法によるビスマス?テルライド系薄膜熱電素子の作製と物性評価
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めっき法によるビスマス?テルライド系薄膜熱電素子の作製と物性評価

机译:电镀法制备基于铋的薄膜型热电元件的物理性能及评价

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摘要

This paper describes the fabrication and characterization of bismuth telluride (Bi-Te), bismuth selenide (Bi-Se) and bismuth telluride selenium (Bi-Te-Se) thin films by electrodeposition. We examined the relationship between the mole ratio in the solution and the thermoelectric and structural properties of thin films. The thermoelectric properties, in terms of the electrical conductivity, Seebeck coefficient and power factor, were measured at room temperature. Then, the structural properties such as surface morphology and atomic composition were analyzed. The power factor of Bi-Te, Bi-Se and Bi-Te-Se thin films were achieved 3.1, 13.3 and 10.3 μW/cm/K~(2), respectively. Although resulting performances were relatively high compared to those of thin films prepare using electrodeposition, there is still room for improvement to optimize the atomic composition of the thin films.
机译:本文介绍了通过电沉积法制备碲化铋(Bi-Te),硒化铋(Bi-Se)和碲化铋铋(Bi-Te-Se)薄膜的方法。我们检查了溶液中的摩尔比与薄膜的热电和结构性质之间的关系。在室温下以电导率,塞贝克系数和功率因数表示热电性能。然后,分析了表面形态和原子组成等结构特性。 Bi-Te,Bi-Se和Bi-Te-Se薄膜的功率因数分别达到3.1、13.3和10.3μW/ cm / K〜(2)。尽管与使用电沉积制备的薄膜相比,所得的性能相对较高,但仍存在改进空间以优化薄膜的原子组成。

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