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3D Parallel Monte Carlo Simulation of GaAs MESFETs

机译:GaAs MESFET的3D并行蒙特卡洛模拟

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We have investigated three-dimensional (3D) effects in sub-micron GaAs MESFETs using a parallel Monte Carlo device simulator, PMC-3D [1]. The parallel algorithm couples a standard Monte Carlo particle simulator for the Boltzmann equation with a 3D Poisson solver using spatial decomposition of the device domain onto separate processors. The scaling properties of the small signal parameters have been simulated for both the gate width in the third dimension as well as the gate length. For realistic 3D device structures, we find that the main performance bottleneck is the Poisson solver rather than the Monte Carlo particle simulator for the parallel successive overrelaxation (SOR) scheme employed in [1]. A parallel multigrid algorithm is reported and compared to the previous SOR implementation, where considerable speedup is obtained.
机译:我们使用并行蒙特卡罗器件仿真器PMC-3D [1]研究了亚微米GaAs MESFET中的三维(3D)效应。并行算法使用设备域的空间分解到单独的处理器上,将用于Boltzmann方程的标准Monte Carlo粒子模拟器与3D Poisson求解器耦合。小信号参数的缩放特性已针对三维尺寸的栅极宽度以及栅极长度进行了仿真。对于逼真的3D设备结构,我们发现对于[1]中采用的并行连续超松弛(SOR)方案,主要性能瓶颈是泊松求解器而不是蒙特卡洛粒子模拟器。报告了一个并行多网格算法,并将其与以前的SOR实现进行了比较,后者在很大程度上实现了加速。

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