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首页> 外文期刊>Turkish journal of physics >Effect of Al and Ga codoping on the morphological, electronic, and opticalproperties of ZnO transparent conductive thin films prepared by spray pyrolysistechnique
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Effect of Al and Ga codoping on the morphological, electronic, and opticalproperties of ZnO transparent conductive thin films prepared by spray pyrolysistechnique

机译:Al和Ga共掺杂对喷雾热解法制备ZnO透明导电薄膜的形貌,电子和光学性质的影响

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Codoping a semiconductor thin film with two or more dopants is a feasible technique to improve the electricalproperties of the thin film. In this work, we studied the codoping of Al and Ga n-type impurities in a ZnO film (AGZO)deposited on a glass substrate by the spray pyrolysis method. The total doping concentration, [Al + Ga]/[Al + Ga +Zn], was 5 at.% with varying AlGa codoping proportions of 05, 1.253.75, 2.52.5, 3.751.25, and 50 at.%. The effectof Al/Ga codoping on the structural, texture, morphological, optical, and electrical properties of the AGZO films wereinvestigated using X-ray diffraction (XRD), atomic force microscope (AFM), scanning electron microscopy (SEM), UVvisiblespectroscopy, and four-point probe technique, respectively. Varying AlGa codoping proportions significantly alterthe textures and morphologies of the AGZO thin films. Thin films with higher Al doping content exhibit amorphouslikestructures due to fine nano grains with high concentrations of disordered grain boundary regions. The opticaltransmittance spectrums show transmittance higher than 80% in the visible light region for all the codoped films. Thesheet resistances and electrical resistivity of the AGZO films are significantly lower than those of the 5 at.% Al-dopedZnO films.
机译:用两种或更多种掺杂剂共掺杂半导体薄膜是提高薄膜电性能的可行技术。在这项工作中,我们研究了通过喷雾热解法在玻璃基板上沉积的ZnO膜(AGZO)中Al和Ga n型杂质的共掺杂。总掺杂浓度[Al + Ga] / [Al + Ga + Zn]为5 at。%,AlGa共掺杂比例分别为05、1.253.75、2.52.5、3.751.25和50 at。%。使用X射线衍射(XRD),原子力显微镜(AFM),扫描电子显微镜(SEM),UV可见光谱和四点探针技术。 AlGa共掺杂比例的变化会显着改变AGZO薄膜的织构和形态。具有较高Al掺杂含量的薄膜由于具有高浓度的无序晶界区域的细纳米颗粒而显示出非晶状结构。光学透射光谱表明,对于所有共掺杂膜,在可见光区域中的透射率均高于80%。 AGZO薄膜的薄层电阻和电阻率明显低于5at。%Al掺杂的ZnO薄膜。

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