SILICON NITRIDE FILMS FOR PHOTOVOLTAIC APPLICATION DEPOSITED IN AN INDUSTRIAL PECVD

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SILICON NITRIDE FILMS FOR PHOTOVOLTAIC APPLICATION DEPOSITED IN AN INDUSTRIAL PECVD

机译：用于工业PECVD的光伏应用的氮化硅膜

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《The African Review of Physics》 |2008年第2008期|共页
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1. SILICON NITRIDE FILMS FOR PHOTOVOLTAIC APPLICATION DEPOSITED IN AN INDUSTRIAL PECVD [J] . A. EL AMRANI, A. LEFGOUM, A. TOUATI, The African Physical Review . 2008,第2008期

机译：用于工业PECVD的光伏应用的氮化硅膜
2. Low-temperature PECVD-deposited silicon nitride thin films for sensor applications [J] . Suchaneck G., Gerlach G., Norkus V. Surface & Coatings Technology . 2001,第0期

机译：传感器应用的低温PECVD沉积氮化硅薄膜
3. Bulk and Surface Passivation of Silicon Solar Cells Accomplished by Silicon Nitride Deposited on Industrial Scale by Microwave PECVD [J] . W. SOPPE, H. RIEFFE, A. WEEBER Progress in photovoltaics . 2005,第7期

机译：微波PECVD工业规模沉积氮化硅完成的硅太阳能电池的体积和表面钝化
4. HYDROGEN CONCENTRATION ANALYSIS IN SEQUENTIALLY DEPOSITED THIN FILMS AND APPLICATION OF SURFACE CHARGE ANALYSIS TECHNIQUE FOR FAST AND NON-DESTRUCTIVE CHARACTERIZATION OF PECVD SILICON NITRIDE [C] . C.Y. Wang, E.H. Lim, V. Y. Vassiliev, International VLSI multilevel interconnection conference;VMIC . 2000

机译：顺序沉积薄膜中的氢浓度分析及表面电荷分析技术在PECVD氮化硅快速无损表征中的应用
5. Hydrogen redistribution in annealed silicon nitride thin films deposited by PECVD. [D] . Nagy, Ferenc Attila. 1997

机译：氢在PECVD沉积的氮化硅薄膜中的重新分布。
6. Crystallization of amorphous silicon thin films deposited by PECVD on nickel-metalized porous silicon [O] . Sonia Ben Slama, Messaoud Hajji, Hatem Ezzaouia 2012

机译：通过PECVD在镍金属化多孔硅上沉积的非晶硅薄膜的结晶
7. Bulk and Surface Passivation of Silicon Solar Cells Accomplished by Silicon Nitride Deposited on Industrial Scale by Microwave PECVD [O] . Prog Photovolt, Henk Rieffe, Arthur Weeber 2004

机译：采用微波pECVD工业规模沉积氮化硅制备硅太阳能电池的体积和表面钝化

SILICON NITRIDE FILMS FOR PHOTOVOLTAIC APPLICATION DEPOSITED IN AN INDUSTRIAL PECVD

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