Characterization of zirconia thin films grown by radio-frequency plasma assisted laser ablation

摘要

In this work we report on the deposition of zirconia as thin films by Radio- Frequency discharge assisted Pulsed Laser Deposition. The influence of the depositionparameters like substrate temperature and RF presence on the structure and morphologyof the deposited layers was studied. Techniques as Atomic Force Microscopy, X-rayDiffraction, Non-Rutherford Backscattering Spectrometry and optical measurementshave been used to characterize the deposited layers. It was found that polycrystallinezirconia thin films with uniform surface morphology, holes and cracks free, wereobtained at 873 K substrate temperature, for a RF power of 150 W.