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Nonvolatile ferroelectric domain wall memory

机译:非易失性铁电畴壁存储器

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Ferroelectric domain walls are atomically sharp topological defects that separate regions of uniform polarization. The discovery of electrical conductivity in specific types of walls gave rise to “domain wall nanoelectronics,” a technology in which the wall (rather than the domain) stores information. This paradigm shift critically hinges on precise nanoengineering of reconfigurable domain walls. Using specially designed nanofabricated electrodes and scanning probe techniques, we demonstrate a prototype nonvolatile ferroelectric domain wall memory, scalable to below 100 nm, whose binary state is defined by the existence or absence of conductive walls. The device can be read out nondestructively at moderate voltages (3) with excellent endurance and retention characteristics, and has multilevel data storage capacity. Our work thus constitutes an important step toward integrated nanoscale ferroelectric domain wall memory devices.
机译:铁电畴壁是原子上尖锐的拓扑缺陷,它们分隔了均匀极化的区域。在特定类型的壁中发现电导率后,出现了“畴壁纳米电子学”,这是一种由壁(而不是畴)存储信息的技术。这种范式转换关键取决于可重构域壁的精确纳米工程。使用专门设计的纳米制造电极和扫描探针技术,我们演示了可扩展至100 nm以下的原型非易失性铁电畴壁存储器,其二进制状态由导电壁的存在或不存在来定义。该设备可以在中等电压(3 )上无损读取,具有出色的耐用性和保留特性,并且具有多级数据存储容量。因此,我们的工作构成了朝着集成纳米级铁电畴壁存储器件迈出的重要一步。

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