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首页> 外文期刊>Optica pura y aplicada >Investigating the electro-optical properties of non-stoichiometric silicon nitride thin films for photovoltaic applications
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Investigating the electro-optical properties of non-stoichiometric silicon nitride thin films for photovoltaic applications

机译:研究用于光伏应用的非化学计量氮化硅薄膜的电光性能

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The electro‐optical properties of devices containing Si‐rich silicon nitride (SRN) thin films, depositedby means of low‐pressure chemical‐vapor deposition (LPCVD), are studied. After optically evidencingthe presence of defects in our films, a Poole‐Frenkel conduction mechanism has been considered,which is in agreement with electrical experiments. We found that the poly‐Si layer stronglymodulates the electroluminescence and light absorption of the devices. In addition, they showedphotocurrent and photoconductivity under illumination, SRN becoming a promising material forphotovoltaic applications.
机译:研究了通过低压化学气相沉积(LPCVD)沉积的包含富硅氮化硅(SRN)薄膜的器件的电光性能。在光学上证明我们的薄膜中存在缺陷之后,我们考虑了Poole-Frenkel传导机制,这与电学实验一致。我们发现多晶硅层强烈调节了器件的电致发光和光吸收。此外,它们在光照下显示出光电流和光电导性,SRN成为用于光伏应用的有前途的材料。

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