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首页> 外文期刊>Materials science-Poland: An interdisciplinary journal of physics, chemistry and technology of materials >Studies on structural, optical and electrical properties of electron beam evaporated Cu2SnSe3 thin films
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Studies on structural, optical and electrical properties of electron beam evaporated Cu2SnSe3 thin films

机译:电子束蒸发Cu2SnSe3薄膜的结构,光学和电学性质研究

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摘要

The present work describes the deposition of semiconducting Cu2SnSe3 thin films by electron beam evaporation method. The structure of the deposited films was characterized by XRD and Raman analysis. X-ray diffraction study revealed that the Cu2SnSe3 thin films had a cubic sphalerite-like structure with crystallite size of 12 nm. Raman spectrum of the thin films confirmed the phase purity. FESEM analysis showed a continuous film with polydispersed grains of a diameter less than 1 цш and the elemental composition was confirmed by EDS spectrum. The UV-Vis spectrum revealed that the sample had high absorption in the visible region and the band gap was found to be 1.15 eV. The I-V graph exhibited the electrical resistivity and conductivity of the film as 2.13 Ω-cm and 0.468 S/cm, respectively. Thus, the electron beam evaporated Cu2SnSe3 thin films showed high purity of structure and good morphological, optical and electrical properties comparable with other methods of thin film deposition.
机译:本工作描述了通过电子束蒸发法沉积半导体Cu2SnSe3薄膜。通过XRD和拉曼分析表征沉积膜的结构。 X射线衍射研究表明,Cu2SnSe3薄膜具有立方闪锌矿状结构,微晶尺寸为12 nm。薄膜的拉曼光谱证实了相纯度。 FESEM分析显示连续膜具有直径小于1цш的多分散晶粒,并且元素组成由EDS光谱确定。 UV-Vis光谱显示样品在可见光区域具有高吸收,并且带隙为1.15eV。 I-V图显示膜的电阻率和电导率分别为2.13Ω-cm和0.468S / cm。因此,与其他薄膜沉积方法相比,电子束蒸发的Cu2SnSe3薄膜显示出高结构纯度和良好的形态,光学和电学性质。

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