首页> 外文会议>DAE Solid State Physics Symposium >Structural, Electrical and Optical Properties of Gallium Doped Zinc Oxide Thin Films Prepared by Electron Beam Evaporation Technique
【24h】

Structural, Electrical and Optical Properties of Gallium Doped Zinc Oxide Thin Films Prepared by Electron Beam Evaporation Technique

机译:通过电子束蒸发技术制备镓掺杂氧化锌薄膜的结构,电气和光学性质

获取原文

摘要

High quality gallium doped zinc oxide (GZO) films are prepared by electron beam evaporation technique. The effect of substrate temperature on structural, electrical and optical properties was studied in detail. The prepared films are polycrystalline in nature with c-axis perpendicular to the substrate. The resistivity of the film decreases and the optical transparency increases as the substrate temperature increases from room temperature to 150 deg C. The film produce the optical band gap of 3.47 eV.
机译:通过电子束蒸发技术制备高质量的镓掺杂氧化锌(GZO)膜。详细研究了基板温度对结构,电气和光学性质的影响。制备的薄膜本质上是具有垂直于基材的C轴的多晶。当基板温度从室温增加到150℃时,膜的电阻率降低并且光学透明度增加。薄膜产生3.47eV的光学带隙。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号