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首页> 外文期刊>Advances in Materials Physics and Chemistry >Electrical Properties of the Al/CuInSe2 Thin Film Schottky Junction
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Electrical Properties of the Al/CuInSe2 Thin Film Schottky Junction

机译:Al / CuInSe2薄膜肖特基结的电学性质

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The Schottky diode (Al/p-CuInSe2/FTO) was fabricated by simple deposition of pure Aluminum on the front side of the CuInSe2 thin film. We have investigated its electrical characteristics by measuring the current-voltage (I-V), the capacitance-voltage (C-V) and the electrical impedance in the range of temperature (300 K - 425 K). At room temperature, this heterostructure has shown non-ideal Schottky behavior with 3.98 as ideality factor and 38 μA/cm2 as a reverse saturated current density. The C-V measured at 100 kHz has shown non-linear behavior and an increase with temperature. Similarly, we have estimated, at room temperature, the carrier doping density, the built-in potential and the depletion layer width which are of about 8.66 × 1015 cm﹣3, 1.12 V and 0.37 μm respectively. By the impedance spectroscopy technique, we have found a decrease with temperature of all the serial resistance Rs, the parallel resistance Rp and the capacitance Cp. The frequency dependence of the imaginary part of this impedance was carried out to characterize the carrier transport properties in the heterostructure. From the Arrhenius diagram, we have estimated the activation energy at 460 meV. An equivalent electrical circuit was used for modeling these results.
机译:肖特基二极管(Al / p-CuInSe2 / FTO)是通过在CuInSe2薄膜的正面简单地沉积纯铝而制成的。我们通过测量温度范围(300 K-425 K)中的电流电压(I-V),电容电压(C-V)和电阻抗来研究其电气特性。在室温下,这种异质结构显示出非理想的肖特基行为,理想因子为3.98,反向饱和电流密度为38μA/ cm2。在100 kHz下测得的C-V表现出非线性行为,并随温度升高而增加。同样,我们估计在室温下,载流子掺杂密度,内建电势和耗尽层宽度分别约为8.66×1015 cm﹣3、1.12 V和0.37μm。通过阻抗谱技术,我们发现所有串联电阻Rs,并联电阻Rp和电容Cp均随温度降低。进行该阻抗的虚部的频率依赖性,以表征异质结构中的载流子传输特性。根据Arrhenius图,我们估计活化能为460 meV。使用等效电路对这些结果进行建模。

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