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Subthreshold Operation of a Monolithically Integrated Strained-Si Current Mirror at Low Temperatures

机译:低温下单片集成应变硅电流镜的亚阈值操作

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The dc operation of a simple current mirror built with two monolithically integrated strained-Si (s-Si) MOSFETs operating in the subthreshold region is studied as a function of temperature. At room temperature, the log-log current relationship is linear over 4 dec. The consumed power is approximately 100 muW at 300 K but only 1 nW at 160 K. The cost of this reduction in power is a reduced linear log-log current range. Reducing the temperature further increases the threshold voltage, obstructing operation below 160 K. A comparison is made with the Si control circuit, highlighting the improved linearity and the threshold voltage stability in the s-Si circuit. The estimated cutoff frequency of the subthreshold strained-Si current mirror at 300 K is 50 MHz, compared to 10 kHz for the Si MOSFETs
机译:研究了一个简单的电流镜的直流操作,该电流镜由两个在阈值以下区域工作的单片集成应变硅(s-Si)MOSFET构建而成,并随温度变化。在室温下,对数-对数电流关系在4 dec内呈线性关系。在300 K时,消耗的功率约为100μW,而在160 K时,仅为1 nW。这种功率降低的代价是减小了线性对数-对数电流范围。降低温度会进一步增加阈值电压,从而阻碍在160 K以下的操作。与Si控制电路进行了比较,强调了s-Si电路中线性度的提高和阈值电压稳定性。亚阈值应变硅电流镜在300 K时的估计截止频率为50 MHz,而Si MOSFET的截止频率为10 kHz

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