首页> 外文期刊>Circuitree >DRILL SMEAR IN HIGH ASPECT RATIO, HIGH RELIABILITY BACKPANELS: Chemical and Plasma Processing
【24h】

DRILL SMEAR IN HIGH ASPECT RATIO, HIGH RELIABILITY BACKPANELS: Chemical and Plasma Processing

机译:高纵横比,高可靠性背板的钻探磨损:化学和等离子处理

获取原文
获取原文并翻译 | 示例

摘要

This article evaluated the benefits in using plasma to desmear/etchback back plane panels and its ability to overcome the limitations of a wet process. Back plane panels are more frequently used in today's designs. The same plasma system can be used for standard panels and back planes―equipment changes are not required. Plasma is a dry process that does not leave residue that can contaminate a surface. Since plasma operates in a vacuum environment, only small amounts of process gas are required to achieve desmear and etchback. Unlike a wet process, plasma etches small vias with selectivity and delivers uniform repeatable results. There are no hazardous wastes produced, therefore additional environmental requirements are nonexistent. Plasma is capable of meeting the challenge of back plane designs without limitations. PCB manufacturers processing non-standard panels, such as back planes, should consider plasma as an etchback and desmear solution.
机译:本文评估了使用等离子对背板进行去污/回蚀的好处,以及克服了湿法工艺的局限性。在当今的设计中,更经常使用背板。同一等离子系统可用于标准面板和背板-无需更改设备。等离子体是一种干燥的过程,不会留下会污染表面的残留物。由于等离子体在真空环境中运行,因此仅需要少量的处理气体即可实现去污和回蚀。与湿法工艺不同,等离子体以选择性方式蚀刻小孔,并提供一致的可重复结果。没有产生有害废物,因此不存在额外的环境要求。等离子能够无限制地应对背板设计的挑战。处理非标准面板(例如底板)的PCB制造商应将等离子体视为回蚀和去污溶液。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号