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Investigation of ultra-short-period W/C multilayers for soft X-ray optics

机译:用于软X射线光学器件的超短周期W / C多层膜的研究

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摘要

Ultra-short-period W/C multilayers having periodic thickness range of 1.15 - 3.01 nm have been fabricated for soft X-ray optics using the high vacuum direct current (DC) magnetron sputtering system. These multilayers were characterized by low-angle X-ray diffraction (LAXRD) and transmission electron microscope (TEM). The results show that the multilayer thin films with periodic thickness more than 1.5 nm have clear W-C interface and low roughness. But the structure of the periodic thickness below 1.5 nm is not clear. Finally, three ways to improve the performance of the multilayers are suggested.
机译:使用高真空直流(DC)磁控管溅射系统已经为软X射线光学器件制造了具有1.15-3.01 nm周期性厚度范围的超短周期W / C多层膜。这些多层通过低角度X射线衍射(LAXRD)和透射电子显微镜(TEM)表征。结果表明,周期厚度大于1.5nm的多层薄膜具有清晰的W-C界面和低粗糙度。但是低于1.5nm的周期性厚度的结构尚不清楚。最后,提出了三种改善多层膜性能的方法。

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