MULTILAYER REFLECTION MIRROR, EXTREME ULTRAVIOLET (EUV) EXPOSURE SYSTEM AND SOFT X-RAY OPTIC EQUIPMENT

摘要

PROBLEM TO BE SOLVED: To provide a multilayer reflection mirror capable of suppressing oxidation of a multilayer film formed by layering materials containing Si and Mo.;SOLUTION: On a glass plate 1, Mo layers 11 and Si layers 12 are deposited alternately and the surface of the topmost layer Si layer 12 is made a hydrogen termination processing Si 13. Therefore, the topmost layer Si layer becomes hard to oxidize. When an oxidizing agent is sent for oxidizing removing contamination, the reflection film is oxidized and lowering of reflectivity is suppressed. The hydrogen termination processing of the surface of the Si layer 12 is desired to be done with hydrofluoric acid treatment.;COPYRIGHT: (C)2006,JPO&NCIPI