Ultra-short-period WC/SiC multilayer coatings for x-ray applications

摘要

Multilayer coatings enhance x-ray mirror performance at incidence angles steeper than the critical angle, allowing for improved flux, design flexibility and facilitating alignment. In an attempt to extend the use of multilayer coatings to photon energies higher than previously achieved, we have developed multilayers with ultra-short periods between 1 and 2 nm based on the material system WC/SiC. This material system was selected because it possesses very sharp and stable interfaces. In this article, we show highlights from a series of experiments performed in order to characterize the stress, microstructure and morphology of the multilayer films, as well as their reflective performance at photon energies from 8 to 384 keV.