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首页> 外文期刊>Bulletin of Materials Science >Electrocaloric effect of PMN-PT thin films near morphotropic phase boundary
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Electrocaloric effect of PMN-PT thin films near morphotropic phase boundary

机译:各向异性相边界附近的PMN-PT薄膜的电热效应

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摘要

The electrocaloric effect is calculated for PMN-PT relaxor ferroelectric thin film near morphotropic phase boundary composition. Thin film of thickness, ∼240 nm, has been deposited using pulsed laser deposition technique on a highly (111) oriented platinized silicon substrate at 700°C and at 100 mtorr oxygen partial pressure. Prior to the deposition of PMN-PT, a template layer of LSCO of thickness, ∼60 nm, is deposited on the platinized silicon substrate to hinder the pyrochlore phase formation. The temperature dependent P-E loops were measured at 200 Hz triangular wave operating at the virtual ground mode. Maximum reversible adiabatic temperature change, ΔT = 31 K, was calculated at 140°C for an external applied voltage of 18 V.
机译:计算PMN-PT弛豫铁电薄膜在接近变质相边界成分时的电热效应。已经使用脉冲激光沉积技术在700°C和100 mtorr的氧分压下,在高度(111)取向的镀铂硅衬底上沉积了厚度约为240 nm的薄膜。在沉积PMN-PT之前,将厚度约为60 nm的LSCO模板层沉积在镀铂的硅基板上,以阻止烧绿石相的形成。温度相关的P-E回路是在虚拟接地模式下以200 Hz三角波测量的。对于18 V的外部施加电压,在140°C下计算出最大可逆绝热温度变化ΔT= 31 K.

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