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Structural, optical, photoluminescence, dielectric and electrical studies of vacuum-evaporated CdTe thin films

机译:真空蒸发CdTe薄膜的结构,光学,光致发光,介电和电学研究

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Highly-oriented CdTe thin films were fabricated on quartz and glass substrates by thermal evaporation technique in the vacuum of about 2 × 10 − 5 torr. The CdTe thin films were characterized by X-ray diffraction (XRD), UV–VIS–NIR, photoluminescence spectroscopy and scanning electron microscopy (SEM). X-ray diffraction results showed that the films were polycrystalline with cubic structure and had preferred growth of grains along the (111) crystallographic direction. Scanning electron micrographs showed that the growth of crystallites of comparable size on both the substrates. At the room temperature, photoluminescence spectra of the films on both the substrates showed sharp peaks with a maximum at 805 nm. This band showed significant narrowing suggesting that it originates from the transitions involving grain boundary defects. The refractive index of CdTe thin films was calculated using interference pattern of transmission spectra. The optical band gap of thin films was found to allow direct transition with energy gap of 1·47–1·50 eV. a.c. conductivity of CdTe thin films was found to increase with the increase in frequency whereas dielectric constant was observed to decrease with the increase in frequency.
机译:通过热蒸发技术在约2×10 -5 托的真空条件下,在石英和玻璃基板上制备了高取向的CdTe薄膜。 CdTe薄膜的特征在于X射线衍射(XRD),UV-VIS-NIR,光致发光光谱和扫描电子显微镜(SEM)。 X射线衍射结果表明,该膜是具有立方结构的多晶,并且沿(111)晶体学方向具有优选的晶粒生长。扫描电子显微照片显示,在两种基材上都生长了相当大小的微晶。在室温下,两个基板上的薄膜的光致发光光谱均显示出锐利的峰,其最大值在805 nm处。该带显示出明显的变窄,表明它起源于涉及晶界缺陷的转变。使用透射光谱的干涉图来计算CdTe薄膜的折射率。发现薄膜的光学带隙允许以1·47-1·50 eV的能隙直接跃迁。交流发现CdTe薄膜的电导率随频率增加而增加,而观察到介电常数随频率增加而减少。

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