EUV Mask Inspection System Suits Finer Chip Patterns

摘要

Lasertec Corporation has recently commercialized the ACTIS A150 defect detection system that supports pattern inspection of extreme ultraviolet (EUV) masks used in EUV lithography. It is the world's first actinic EUV patterned mask inspection system. Amid the advancement of devices to have increasingly finer patterns, ACTIS A150 overcomes challenges in EUV lithography and supports the production of leading-edge semiconductors.