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机译:纳秒激光退火Si_(1-X)Ge_x / Si脱落器中重结晶和应力松弛的研究
Univ Grenoble Alpes LETI CEA F-38000 Grenoble France|Univ Toulouse UPS LAAS CNRS F-31031 Toulouse France;
Univ Grenoble Alpes LETI CEA F-38000 Grenoble France;
Univ Grenoble Alpes LETI CEA F-38000 Grenoble France;
Univ Grenoble Alpes LETI CEA F-38000 Grenoble France;
Univ Grenoble Alpes LETI CEA F-38000 Grenoble France;
Univ Grenoble Alpes LETI CEA F-38000 Grenoble France;
Univ Toulouse UPS LAAS CNRS F-31031 Toulouse France;
Univ Toulouse UPS LAAS CNRS F-31031 Toulouse France;
Nanosecond; Laser annealing; SiGe; Surface nanostructures; Strain; Segregation;
机译:离子注入和后续退火工艺制备的Si / Si_(1-x)Ge_x / Si结构的应力松弛
机译:热退火对离子束溅射非晶Si_(1-x)Ge_x薄膜应力松弛和结晶的影响
机译:惰性和干氧化环境退火下硅中的空洞演化以及Si_(1-x)Ge_x外延层帽的作用
机译:CESL压力源对在Si_(0.72)Ge_(0.28)外膜(0.28)的Pt溶解NISI_(1-x)Ge_x的形态稳定性的影响
机译:硅的激光束处理:绝缘体上硅材料和器件的激光退火和激光重结晶研究
机译:用于闪烁的Lu2(1-x)Y2xSiO5(LYSO)单晶的缺陷识别和退火效果
机译:通过分子束外延对在(100)Si上生长的Si_(1-x)Ge_x合金进行(2X8)表面重构的观察
机译:si_(1-x)Ge_x / si异质结内部光电发射红外探测器的光响应模型