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机译:热退火对离子束溅射非晶Si_(1-x)Ge_x薄膜应力松弛和结晶的影响
Univ Western Australia, Dept Elect Elect & Comp Engn, Perth, WA 6009, Australia;
Univ Western Australia, Dept Elect Elect & Comp Engn, Perth, WA 6009, Australia;
Univ Western Australia, Dept Elect Elect & Comp Engn, Perth, WA 6009, Australia;
Univ Western Australia, Dept Mech Engn, Perth, WA 6009, Australia;
Univ Western Australia, Dept Elect Elect & Comp Engn, Perth, WA 6009, Australia;
Univ Western Australia, Dept Elect Elect & Comp Engn, Perth, WA 6009, Australia;
SiGe; Thin films; Biased target sputtering; Stress relaxation; Annealing;
机译:退火气氛对非晶Si_(1-x)Ge_x薄膜结晶的拉曼光谱影响
机译:快速热退火后Si(100)上外延薄Si_(1-x)Ge_x层中Ge扩散和Si应力变化的显微拉曼表征
机译:掠入射X射线衍射研究磁控溅射非晶Si_(1-x)C _x薄膜(x = 1/3)的结晶
机译:Si(100)衬底上的Si_(1-x)Ge_x薄膜中的应变弛豫:建模和实验比较
机译:(100)硅上溅射镍钛薄膜的等温和等时退火过程中的应力演变。
机译:退火温度和氧气流量对离子束溅射SnO2-x薄膜性能的影响
机译:通过分子束外延对在(100)Si上生长的Si_(1-x)Ge_x合金进行(2X8)表面重构的观察
机译:si_(1-x)Ge_x / si异质结内部光电发射红外探测器的光响应模型