首页> 外文期刊>Applied Surface Science >Effective method to simultaneously release residual stress and promote planarization of surface indentation achieved by secondary indentation
【24h】

Effective method to simultaneously release residual stress and promote planarization of surface indentation achieved by secondary indentation

机译:同时释放残余应力的有效方法,促进次级压痕所实现的表面压痕平坦化

获取原文
获取原文并翻译 | 示例

摘要

Regarding the surface residual stress and accompanied pile-up phenomenon produced during indentation, a novel method was proposed to effectively release residual stress and promote surface planarization. The procedures included an initiation indentation by using Vickers indenter and a secondary indentation at nano-scale on already formed surface by using a cube-corner indenter. Both finite element analysis and indentation experiments revealed significant stress release and surface planarization, which were closely dependent with the indentation depth and location. A 33.03% stress reduction and an internal energy reduction of 6.04 x 10(-8) J were obtained through finite element analysis. Meanwhile, due to the effect of secondary indentation, the average residual stress and crystallinity of AlSi7Mg0.3 alloy specimen were reduced by 64.09% and 49.72%, respectively, which was calculated by X-ray microdiffraction (mu XRD), the atomic force microscopy (AFM) micrographs of initiation and secondary indentation edges also indicated a pile-up reduction with 368.7 +/- 46.1 nm, which verified the planarization through the comparison of pile-up displacements between symmetrical paths.
机译:关于在压痕期间产生的表面残余应力和伴随的堆积现象,提出了一种新的方法,以有效地释放残余应力并促进表面平坦化。通过使用立方体角压紧的纳米级以纳米级以纳米级以纳米级的次级压痕包括启动凹口。两个有限元分析和压痕实验都揭示了显着的应力释放和表面平坦化,这与压痕深度和位置密切相关。通过有限元分析获得33.03%的应力降低和6.04×10(-8)J的内部能量减少。同时,由于次级压痕的影响,Alsi7mg0.3合金试样的平均残余应力和结晶度分别降低了64.09%和49.72%,通过X射线微缩合(MU XRD),原子力显微镜计算(AFM)发起和次级压痕边缘的显微照片还表明了368.7 +/- 46.1nm的堆积减少,通过比较对称路径之间的堆积位移来验证平坦化。

著录项

  • 来源
    《Applied Surface Science》 |2020年第15期|144712.1-144712.6|共6页
  • 作者单位

    Jilin Univ Sch Mech & Aerosp Engn Changchun 130025 Peoples R China|Jilin Univ Key Lab Bion Engn Minist Educ Changchun 130025 Peoples R China;

    Jilin Univ Sch Mech & Aerosp Engn Changchun 130025 Peoples R China;

    Jilin Univ Sch Mech & Aerosp Engn Changchun 130025 Peoples R China;

    Jilin Univ Sch Mech & Aerosp Engn Changchun 130025 Peoples R China;

    Jilin Univ Key Lab Bion Engn Minist Educ Changchun 130025 Peoples R China;

    Jilin Univ Sch Mech & Aerosp Engn Changchun 130025 Peoples R China;

    Jilin Univ Key Lab Bion Engn Minist Educ Changchun 130025 Peoples R China;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Nanoindentation; Surface planarization; Residual stress; Pile-up; Elastic energy;

    机译:纳米intentation;表面平面化;残余应力;堆积;弹性能量;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号