首页> 外文期刊>Applied Surface Science >Optical and dielectric properties of highly oriented (Zr-0.8,Sn-0.2)TiO4 thin films prepared by rf magnetron sputtering
【24h】

Optical and dielectric properties of highly oriented (Zr-0.8,Sn-0.2)TiO4 thin films prepared by rf magnetron sputtering

机译:射频磁控溅射制备高取向(Zr-0.8,Sn-0.2)TiO4薄膜的光学和介电性能

获取原文
获取原文并翻译 | 示例
           

摘要

(Zr-0.8,Sn-0.2)TiO4 (ZST) thin films (similar to150 nm) were grown on Pt/Ti/SiO2/Si(100) and fused quartz glass substrates by radio frequency (rf) magnetron sputtering. The microstructure and the surface morphology of ZST thin film have been studied by Xray diffraction (XRD) and atomic force microscopy (AFM). The optical properties of ZST thin film were obtained by spectroscopic ellipsometry and UV-Vis spectrometry for the first time. The optical band gap was found to be 3.30 eV of indirect-transition type. The low frequency (1 kHz-1 MHz) dielectric properties of ZST thin film were also discussed. The temperature coefficient of capacitance (TCC) of ZST thin film is about 80.2 ppm/degreesC at I MHz. The dielectric constant and dielectric loss at 100 kHz are 36.6 and 0.0069, respectively. The large dielectric loss compared with that of ZST ceramic is caused by the structure disorder in the thin film. (C) 2003 Elsevier Science B.V. All rights reserved. [References: 24]
机译:通过射频(rf)磁控溅射在Pt / Ti / SiO2 / Si(100)和熔融石英玻璃基板上生长(Zr-0.8,Sn-0.2)TiO4(ZST)薄膜(类似于150 nm)。通过X射线衍射(XRD)和原子力显微镜(AFM)研究了ZST薄膜的微观结构和表面形貌。 ZST薄膜的光学性能是首次通过椭圆偏振光谱法和UV-Vis光谱法获得。发现该光学带隙是间接转变型的3.30eV。还讨论了ZST薄膜的低频(1 kHz-1 MHz)介电性能。 ZST薄膜的电容温度系数(TCC)在1 MHz时约为80.2 ppm /℃。 100 kHz时的介电常数和介电损耗分别为36.6和0.0069。与ZST陶瓷相比,较大的介电损耗是由薄膜中的结构紊乱引起的。 (C)2003 Elsevier Science B.V.保留所有权利。 [参考:24]

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号