首页> 外文期刊>Applied Surface Science >Critical density effects in femtosecond ablation plasmas and consequences for high intensity pulsed laser deposition
【24h】

Critical density effects in femtosecond ablation plasmas and consequences for high intensity pulsed laser deposition

机译:飞秒烧蚀等离子体中的临界密度效应以及高强度脉冲激光沉积的后果

获取原文
获取原文并翻译 | 示例
           

摘要

Laser ablation plumes produced by a single pulse from an ultrafast laser consist, in the far field where film deposition occurs, of mostly neutral atoms, a percentage of ionized species, and, very often, condensed clusters. In certain situations adding energy to the plume may be of interest for a deposition, and methods for increasing the charged fraction need to be considered. This paper examines these issues and demonstrates a method for overcoming the plasma critical density limitations encountered for absorption of a single pulse. Precisely controlled time-delayed secondary pulses are used to change the average charge state, temperature, and plasma density of the far field plume, with implications for thin film deposition and nano-cluster formation. A plasma-jet nozzle effect is proposed to explain condensed cluster formation of germanium. Results are also presented in relation to enhanced isotope enrichment for boron.
机译:在发生薄膜沉积的远场中,由超快激光产生的单个脉冲所产生的激光烧蚀羽流主要由中性原子,一定比例的离子化物种组成,并且常常是凝聚的团簇。在某些情况下,向羽流添加能量可能对沉积很重要,因此需要考虑增加带电分数的方法。本文研究了这些问题,并演示了一种克服单个脉冲吸收所遇到的等离子体临界密度限制的方法。精确控制的延时次级脉冲用于改变远场羽流的平均电荷状态,温度和等离子体密度,这对薄膜沉积和纳米簇的形成有影响。提出了等离子喷嘴效应来解释锗的凝聚团簇形成。还提出了与增强硼同位素富集有关的结果。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号