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首页> 外文期刊>Applied Surface Science >Study of GaN_xAs_(1-x) semiconducting films grown by laser pulsed deposition on crystalline and amorphous substrates
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Study of GaN_xAs_(1-x) semiconducting films grown by laser pulsed deposition on crystalline and amorphous substrates

机译:在晶体和非晶衬底上激光脉冲沉积生长的GaN_xAs_(1-x)半导体薄膜的研究

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摘要

The search for semiconductors with band gap energies in the green-blue region of the visible spectra has stimulated the development of new ternaries in the Ⅱ-Ⅵ and Ⅲ-nitrides systems. In the GaN-side of the GaNAs ternary compound it is expected that the band gap energy could be adjusted for all the visible spectra by changing the N concentration in the compound. We report on the growth of the ternary compound semiconductor GaN_xAs_(1-x) thin films by using the laser ablation deposition technique in a reactive nitrogen gas atmosphere, on crystalline GaAs(100) and Si(001) substrates and also on Corning glass substrates. We have studied the optical properties of these GaN_xAs_(1-x) films by means of the photoacoustic (PA) and the low temperature photoluminescence (PL) spectroscopies. PL spectra for GaNAs samples showed a broad emission band peaked at around 2.50 eV, a weak broad emission band at about 3.05 eV, and a double-peaked structure located at energies corresponding to violet luminescence band; besides, a very weak emission could be measured at energies of about 1.65-1.68 eV. We interpret these results in terms of the presence of the ternary GaNAs phase and cubic and hexagonal GaN phases.
机译:在可见光谱的蓝绿色区域中寻找具有带隙能的半导体,刺激了Ⅱ-Ⅵ和Ⅲ-氮化物体系中新三元的发展。预期在GaNAs三元化合物的GaN侧,可以通过改变化合物中的N浓度来调整所有可见光谱的带隙能量。我们通过使用激光烧蚀沉积技术在活性氮气气氛中,晶体GaAs(100)和Si(001)衬底以及康宁玻璃衬底上生长三元化合物半导体GaN_xAs_(1-x)薄膜的方法进行了报道。我们已经通过光声(PA)和低温光致发光(PL)光谱学研究了这些GaN_xAs_(1-x)薄膜的光学特性。 GaNAs样品的PL光谱显示在2.50 eV附近有一个较宽的发射带峰,在约3.05 eV附近有一个较弱的宽发射带,并且双峰结构位于对应于紫色发光带的能量上。此外,在大约1.65-1.68 eV的能量下可以测得非常弱的发射。我们根据三元GaNAs相以及立方和六方GaN相的存在来解释这些结果。

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