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Microstructures of pulsed laser deposited Eu doped Y2O3 luminescent films on Si(001) substrates

机译:Si(001)衬底上脉冲激光沉积Eu掺杂Y2O3发光膜的微观结构

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Europium doped yttrium oxide (Y2O3:Eu) luminescent thin films were grown on Si(0 0 1) substrates using a pulsed laser deposition technique and their microstructures and growth behavior were investigated by synchrotron X-ray scattering and atomic force microscopy. We observed that the surface morphology of the Y2O3:Eu films was very smooth with typically a 0.5-nm root mean square roughness for the films up to 750 run in thickness and the film strain increased gradually with film thickness. suggesting that the Y2O3:Eu films are grown with a layer-like growth mode. Grown with the (I 1 1) preferred orientation. the Y2O3:Eu films significantly improved in crystallinity with film thickness, showing a characteristic red luminescence Of Y2O3:Eu materials. (C) 2003 Elsevier B.V. All rights reserved. [References: 15]
机译:使用脉冲激光沉积技术在Si(0 0 1)衬底上生长了掺do氧化钇(Y2O3:Eu)发光薄膜,并通过同步加速器X射线散射和原子力显微镜研究了它们的微观结构和生长行为。我们观察到,Y2O3:Eu薄膜的表面形态非常光滑,对于厚度达750纳米的薄膜,其典型均方根粗糙度为0.5 nm,并且薄膜应变随薄膜厚度的增加而逐渐增加。这表明Y2O3:Eu膜以层状生长模式生长。以(I 1 1)首选方向生长。 Y2O3:Eu膜的结晶度随膜厚的增加而显着提高,表现出Y2O3:Eu材料的特征性红色发光。 (C)2003 Elsevier B.V.保留所有权利。 [参考:15]

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