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Analysis of porous oxide film growth on aluminum in phosphoric acid using re-anodizing technique

机译:再阳极氧化技术分析铝在磷酸中多孔氧化膜的生长

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The effects of the anodizing voltage on the porous alumina film formation on Al foil in 4% phosphoric acid at 20 degrees C have been studied. The barrier layer thickness of porous films was determined by a re-anodizing technique. A digital voltmeter with a computer system was used to record the change in the anode potential with re-anodizing time. It was established that the change in the porous film growth mechanism occurred at 38 V in phosphoric acid. We explained this phenomenon by the surface charge of anodic oxide film and its dependence on the anodizing voltage in the electrolyte. It was shown that the surface charge of oxide film during anodizing in phosphoric acid to 38 V was negative. The charge was equal to zero at 38 V. Above 38 V, the surface of oxide film had a positive charge and this charge increased with the anodizing voltage. (c) 2004 Elsevier B.V. All rights reserved.
机译:研究了阳极氧化电压对20℃4%磷酸中铝箔上多孔氧化铝膜形成的影响。多孔膜的阻挡层厚度通过再阳极氧化技术确定。使用带有计算机系统的数字电压表来记录阳极电位随重新阳极化时间的变化。可以确定的是,多孔膜生长机制的变化发生在38 V的磷酸中。我们通过阳极氧化膜的表面电荷及其对电解质中阳极氧化电压的依赖性来解释这种现象。结果表明,在磷酸中阳极氧化至38 V时,氧化膜的表面电荷为负。电荷在38 V时等于零。在38 V以上,氧化膜的表面带有正电荷,并且该电荷随阳极氧化电压的增加而增加。 (c)2004 Elsevier B.V.保留所有权利。

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