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Pulsed-laser crystallization and epitaxial growth of metal-organic films of Ca-doped LaMnO_3 on STO and LSAT substrates

机译:在STO和LSAT衬底上的Ca掺杂LaMnO_3的金属激光薄膜的脉冲激光结晶和外延生长

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摘要

Ca-doped LaMnO_3 (LCMO) thin films have been successfully prepared on SrTiO_3 (STO) and [(LaAlO_3)_(0.3)-(SrAlTaO_6)_(0.7)] (LSAT) substrates using the excimer laser assisted metal-organic deposition (ELAMOD) process. The crystallization and the epitaxial growth of the amorphous metal-organic LCMO thin films have been achieved using a KrF excimer laser irradiation while the substrates were kept at constant temperature of 500℃. Epitaxial films were obtained using laser fluence in the interval of 50-120 mJ/cm~2. The microstructure of the LCMO films was studied using cross-section transmission electron microscopy. High quality of LCMO films having smooth surfaces and sharp interfaces were obtained on both the STO and the LSAT substrates. The effect of the laser fluence on the temperature coefficient of resistance (TCR) was investigated. The largest values of TCR of the LCMO grown on the LSAT and the STO substrates of 8.3% K~(-1) and 7.46% K~(-1) were obtained at different laser fluence of 80 mJ/cm~2 and 70 mJ/cm~2, respectively.
机译:已经使用准分子激光辅助金属有机沉积技术成功地在SrTiO_3(STO)和[(LaAlO_3)_(0.3)-(SrAlTaO_6)_(0.7)](LSAT)衬底上成功制备了Ca掺杂LaMnO_3(LCMO)薄膜。 ELAMOD)过程。使用KrF受激准分子激光辐照,同时将基板保持在500℃的恒定温度下,实现了非晶态有机金属LCMO薄膜的结晶和外延生长。使用激光注量以50-120 mJ / cm〜2的间隔获得外延膜。使用横截面透射电子显微镜研究了LCMO薄膜的微观结构。在STO和LSAT基板上均获得了具有光滑表面和清晰界面的高质量LCMO薄膜。研究了激光能量密度对电阻温度系数(TCR)的影响。在80 mJ / cm〜2和70 mJ的不同激光通量下,在LSAT和STO衬底上生长的LCMO的TCR最大值分别为8.3%K〜(-1)和7.46%K〜(-1)。 / cm〜2。

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