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Improved performance of organic light-emitting devices with plasma treated ITO surface and plasma polymerized methyl methacrylate buffer layer

机译:等离子体处理过的ITO表面和等离子体聚合的甲基丙烯酸甲酯缓冲层的有机发光器件的性能提高

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Transparent indium-tin-oxide (ITO) anode surface was modified using O_3 plasma and organic ultra-thin buffer layers were deposited on the ITO surface using 13.56 MHz rf plasma polymerization technique. A plasma polymerized methyl methacrylate (ppMMA) ultra-thin buffer layer was deposited between the ITO anode and hole transporting layer (HTL). The plasma polymerization of the buffer layer was carried out at a homemade capacitively coupled plasma (CCP) equipment. N,N'-Diphenyl-N,N'-bis(3-methylphenyl)-1,1'-diphenyl-4,4'-diamine (TPD) as HTL, Tris(8-hydroxy-quinolinato)aluminum (Alq_3) as both emitting layer (EML)/electron transporting layer (ETL), and aluminum layer as cathode were deposited using thermal evaporation technique. Electroluminescence (EL) efficiency, operating voltage and stability of the organic light-emitting devices (OLEDs) were investigated in order'to study the effect of the plasma surface treatment of the ITO anode and role of plasma polymerized methyl methacrylate as an organic ultra-thin buffer layer.
机译:使用O_3等离子体修饰了透明的氧化铟锡(ITO)阳极表面,并使用13.56 MHz rf等离子体聚合技术在ITO表面上沉积了有机超薄缓冲层。等离子体聚合的甲基丙烯酸甲酯(ppMMA)超薄缓冲层沉积在ITO阳极和空穴传输层(HTL)之间。缓冲层的等离子体聚合是在自制的电容耦合等离子体(CCP)设备上进行的。 N,N'-二苯基-N,N'-双(3-甲基苯基)-1,1'-二苯基-4,4'-二胺(TPD)作为HTL,三(8-羟基-喹啉基)铝(Alq_3)使用热蒸发技术沉积作为发射层(EML)/电子传输层(ETL)的铝层和作为阴极的铝层。为了研究ITO阳极的等离子体表面处理的效果以及等离子体聚合的甲基丙烯酸甲酯作为有机超有机材料的作用,研究了有机发光器件(OLED)的电致发光(EL)效率,工作电压和稳定性。薄缓冲层。

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