HIGH-DENSITY PLASMA TREATING DEVICE AND FORMATION OF POLYMERIZED ORGANIC THIN FILM AND SUBSTRATE SURFACE IMPROVEMENT BY UTILIZING PLASMA

摘要

PURPOSE:To form plasma to a higher density with the plasma device for the surface treatment of a substrate by providing a permanent magnet on the rear surface of the substrate. CONSTITUTION:The plasma treating device which deposits the film on the surface of the substrate 4 or makes the surface treatment of the substrate 4 by utilizing the plasma is provided with the permanent magnet 3 consisting of a rare earth system on the rear surface of the substrate 4 and a magnetic field is formed in the direction perpendicular to the surface of the substrate 4 to focus the plasma to the surface of the substrate 4. The plasma beam having the high density and high activity is acted on the limited region of the substrate 4 in this way.