首页> 外文期刊>Applied Surface Science >Optical characterization of hydrogen-free CeO_2 doped DLC films deposited by unbalanced magnetron sputtering
【24h】

Optical characterization of hydrogen-free CeO_2 doped DLC films deposited by unbalanced magnetron sputtering

机译:不平衡磁控溅射沉积无氢掺杂CeO_2的DLC薄膜的光学表征

获取原文
获取原文并翻译 | 示例

摘要

A novel kind of hydrogen-free CeO_2 doped diamond-like carbon (DLC) films with thickness of 180-200 nm were deposited on silicon by unbalanced magnetron sputtering. Reduced reflectance and increased lifetime are expected with respect to pure DLC films, making these coatings good candidates as optical protective coatings for IR windows and solar cells. X-ray photoelectron spectroscopy confirms that CeO_2 is formed within the DLC films. Auger electron spectroscopy exhibits that the C, O, and Ce elements distribute uniformly across the film thickness, and C element diffuses into the Si substrate at the interface between the substrate and film. AFM shows that nanoparticles with diameter of around 50 nm are formed on the surface of deposited films, whose surface roughness is in the range of 1.3-2.3 nm. Raman spectra show the CeO_2 doped DLC films are amorphous DLC films, and both the G frequency and relative intensity ratio I_D/I_G are higher than those of pure DLC films. The photoluminescence of CeO_2 doped DLC films is obviously more intense than that of a pure DLC film, which indicates a promising potential as optical protective films for solar cells and IR window.
机译:通过不平衡磁控溅射在硅上沉积了厚度为180-200 nm的新型无氢CeO_2掺杂类金刚石碳(DLC)薄膜。相对于纯DLC膜,预期反射率会降低,使用寿命会延长,这使这些涂层成为IR窗和太阳能电池的光学保护涂层的理想选择。 X射线光电子能谱证实在DLC膜内形成了CeO_2。俄歇电子能谱显示,C,O和Ce元素在整个膜厚度上均匀分布,并且C元素在衬底和膜之间的界面扩散到Si衬底中。 AFM显示在沉积膜的表面上形成直径约50nm的纳米颗粒,其表面粗糙度在1.3-2.3nm的范围内。拉曼光谱表明,CeO_2掺杂的DLC薄膜是非晶DLC薄膜,其G频率和相对强度比I_D / I_G均高于纯DLC薄膜。掺CeO_2的DLC薄膜的光致发光显然比纯DLC薄膜的光致发光强,这表明它有潜力用作太阳能电池和红外窗口的光学保护膜。

著录项

  • 来源
    《Applied Surface Science》 |2008年第5p2期|2655-2659|共5页
  • 作者单位

    Key Laboratory for Precision and Non-Traditional Machining Technology of Ministry of Education, Dalian University of Technology, Dalian 116024, PR China;

    Institute of Internal Combustion Engines, Dalian University of Technology, Dalian 116024, PR China;

    Key Laboratory for Precision and Non-Traditional Machining Technology of Ministry of Education, Dalian University of Technology, Dalian 116024, PR China;

    Key Laboratory for Precision and Non-Traditional Machining Technology of Ministry of Education, Dalian University of Technology, Dalian 116024, PR China;

    Key Laboratory for Precision and Non-Traditional Machining Technology of Ministry of Education, Dalian University of Technology, Dalian 116024, PR China;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    CeO_2; DLC; optical property; unbalanced magnetron sputtering;

    机译:CeO_2;DLC;光学性质不平衡磁控溅射;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号