Interconnection Effects On The Performance Of Basic Subcircuits With Single-electron Tunneling Devices

摘要

Interconnection limits seem to be a potential problem to the evolution of the semiconductor industry, especially in the nanoscale. In this work, the electrical performance of basic cells is studied with the help of a simple interconnection model, whose parameters can be changed. Our goal, with this study, is to determine the interconnection's influence upon the circuit behavior and to establish interconnection-related limits for its functionality. An extrapolation to more complex circuit topologies is also discussed. Finally, the implementation possibilities using new interconnection technologies, like carbon nanotubes, are presented.