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Growth Mechanism And Characterisation Of Chemically Grown Sb Doped Bi_2se_3 Thin Films

机译:化学生长掺Sb的Bi_2se_3薄膜的生长机理及表征

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The synthesis of combinatorial Bi_(2-x)Sb_xSe_3 thin films by arrested precipitation technique (APT) using triethanolamine-bismuth, triethanolamine-antimony and sodium selenosulphite as sources of Bi~(3+), Sb~(3+) and Se~(2-), respectively is investigated on commercial glass substrates. The growth mechanism of film formation, composition and surface morphology of the as deposited films were studied as a function of preparative parameters and bath composition. The films were monophasic, polycrystalline and covered the surface of the substrate completely. Energy dispersive X-ray analysis gave coherent elemental composition indicating single phase BiSbSe_3 was made. The good results obtained for Bi_(2-x)Sb_xSe_3 thin films revealed that arrested precipitation technique is best suited for the deposition of large area thin films on conductingonconducting substrates to produce materials for device applications.
机译:以三乙醇胺-铋,三乙醇胺-锑和亚硒酸钠为Bi〜(3 +),Sb〜(3+)和Se〜的来源,采用阻滞沉淀技术(APT)合成Bi_(2-x)Sb_xSe_3薄膜。 (2-)分别在商用玻璃基板上进行了研究。研究了成膜的生长机理,沉积膜的组成和表面形态与制备参数和镀液组成的关系。膜是单相的,多晶的,并且完全覆盖了基材的表面。能量色散X射线分析得出相干元素组成,表明制备了单相BiSbSe_3。 Bi_(2-x)Sb_xSe_3薄膜获得的良好结果表明,阻滞沉淀技术最适合在导电/不导电基板上沉积大面积薄膜,以生产用于器件的材料。

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