首页> 外文期刊>Applied Surface Science >Effect Of Deposition Voltage On The Field Emission Properties Of Electrodeposited Diamond-like Carbon Films
【24h】

Effect Of Deposition Voltage On The Field Emission Properties Of Electrodeposited Diamond-like Carbon Films

机译:沉积电压对电沉积类金刚石碳膜场发射性能的影响

获取原文
获取原文并翻译 | 示例
       

摘要

Diamond-like carbon (DLC) films were deposited on Al substrates by electrodeposition technique under various voltages. The surface morphology and compositions of synthesized films were characterized by scanning electron microscopy and Raman spectroscopy. With the increase of deposition voltage, the sp~2 phase concentration decreased and the surface morphology changed dramatically. The influence of deposition voltage on the field electron emission (FEE) properties of DLC films was not monotonic due to two adverse effects of deposition voltage on the surface morphology and compositions. The DLC film deposited under 1200 V exhibited optimum FEE property, including a lowest threshold field of 13 V/μm and a largest emission current density of 904.8 μA/cm~2 at 23.5 V/μm.
机译:通过电沉积技术在各种电压下将类金刚石碳(DLC)膜沉积在Al基板上。通过扫描电子显微镜和拉曼光谱对合成膜的表面形貌和组成进行了表征。随着沉积电压的升高,sp〜2相浓度降低,表面形貌发生了显着变化。由于沉积电压对表面形态和组成的两个不利影响,沉积电压对DLC薄膜的场电子发射(FEE)性能的影响不是单调的。在1200V下沉积的DLC膜表现出最佳的FEE性能,最低阈值场为13V /μm,最大发射电流密度为23.5V /μm,为904.8μA/ cm〜2。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号