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Theoretical Characterization Of Carrier Compensation In P-doped Diamond

机译:P掺杂金刚石中载流子补偿的理论表征

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Based on the electron-hole recombination ratio (the number of electron-hole recombination in unit time and volume), we have examined several P complexes surrounded with vacancy (V) or H to explore the effect of carrier compensation on the electronic properties in P-doped diamond by first-principle calculations. Our calculated results show that the monovacancy complex P-V-H is not a valid recombination center in P-doped diamond, in which case electron cannot be recombined and thus donor cannot be compensated. However, the level in the band gap introduced by the divacancy complex P-2V-2H is a valid recombination center, which accelerates the electron-hole recombination at high ratio. For the trivacancy complex P-3V, three levels are introduced near the middle of the band gap, which may serve as more valid recombination centers than others. In this case, the electron-hole recombination ratio enhances successively, namely, the compensator density increases continuously too. In addition, the electronic properties of the P-related complexes in negative charge states are similar with those of neutral charge states. The study may explain well the experimental results and be useful for the further experiment research.
机译:根据电子-空穴复合率(单位时间和体积的电子-空穴复合数),我们研究了几种空位(V)或H包围的P配合物,以研究载流子补偿对P中电子性质的影响。第一性原理计算出掺杂的金刚石。我们的计算结果表明,单空位配合物P-V-H在掺P的金刚石中不是有效的复合中心,在这种情况下,电子无法重组,因此不能补偿供体。然而,由空位配合物P-2V-2H引入的带隙能级是有效的复合中心,其以高比例促进了电子-空穴的复合。对于三空位复合物P-3V,在带隙中间附近引入了三个能级,这可能是比其他能级更有效的重组中心。在这种情况下,电子-空穴复合率连续提高,即补偿器密度也连续增加。另外,在负电荷状态下P相关配合物的电子性质与中性电荷状态相似。该研究可以很好地解释实验结果,对进一步的实验研究很有帮助。

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