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Effect of complexing agent on the photoelectrochemical properties of bath deposited CdS thin films

机译:络合剂对浴沉积CdS薄膜光电化学性能的影响

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In the present paper photoelectrochemical (PEC) performance of bath deposited CdS thin films based on complexing agents i.e. ammonia and triethanolamine (TEA) has been discussed. Effect of annealing has also been analyzed. The as-deposited and annealed (at 523 K for 1 h in air) films were characterized by X-ray diffraction (XRD), ultraviolet-visible (UV-vis) absorption spectroscopy, SEM, electrochemical impedance spectroscopy (EIS), and PEC properties. XRD studies revealed that the films were nanocrystalline in nature with mixed hexagonal and cubic phases. TEA complex resulted in better crystallinity. Further improvement in the crystallinity of the films was observed after air annealing. The marigold flower-like structure, in addition to flakes morphology, was observed with TEA complex, whereas for ammonia complex only flakes morphology was observed. The UV-vis absorption studies revealed that the optical absorption edge for the films with ammonia and TEA complex was around 475 nm and 500 nm, respectively. Annealing of the films resulted in red shift in the UV-vis absorption. The PEC cell performance of CdS films was found to be strongly affected by crystallinity and morphology of the films resulted due to complexing agent and annealing. The air annealed film deposited using TEA complex showed maximum short circuit current density (J_(sc)) and open circuit voltage (V_(oc)) i.e. 99 μA/ cm~2 and 376 mV respectively, under 10 mW/cm~2 of illumination. The films deposited using TEA complex showed good stability under PEC cell conditions.
机译:在本文中,已经讨论了基于络合剂即氨和三乙醇胺(TEA)的浴沉积的CdS薄膜的光电化学(PEC)性能。还分析了退火的效果。通过X射线衍射(XRD),紫外可见(UV-vis)吸收光谱,SEM,电化学阻抗谱(EIS)和PEC对沉积和退火的薄膜(在空气中523 K下在空气中1小时)进行表征属性。 XRD研究表明,薄膜本质上是纳米晶,具有六方相和立方相混合。 TEA复合物具有更好的结晶度。空气退火后,观察到膜的结晶度进一步改善。用薄片状TEA配合物还观察到了金盏花的花状结构,而对于氨络合物仅观察到了薄片状。紫外可见吸收研究表明,具有氨和TEA配合物的薄膜的光吸收边缘分别约为475 nm和500 nm。薄膜的退火导致紫外可见吸收的红移。发现CdS膜的PEC电池性能受络合剂和退火的影响,其结晶度和膜的形貌强烈影响其性能。在10 mW / cm〜2的温度下,使用TEA络合物沉积的空气退火膜显示出最大短路电流密度(J_(sc))和开路电压(V_(oc))分别为99μA/ cm〜2和376 mV。照明。使用TEA配合物沉积的薄膜在PEC细胞条件下显示出良好的稳定性。

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