机译:在NaF溶液中选择性蚀刻InP
Centre for Nano Metrology and Manufacturing Technologies, Changchun University of Science and Technology, Weixing Road No. 7089, Changchun, Jilin Province 130022, China;
School of Science, Changchun University of Science and Technology, Changchun, Jilin Province 130022, China;
Software Department, Beijing City University, Beijing 100093, China;
School of Science, Changchun University of Science and Technology, Changchun, Jilin Province 130022, China;
School of Science, Changchun University of Science and Technology, Changchun, Jilin Province 130022, China;
Centre for Nano Metrology and Manufacturing Technologies, Changchun University of Science and Technology, Weixing Road No. 7089, Changchun, Jilin Province 130022, China;
Centre for Nano Metrology and Manufacturing Technologies, Changchun University of Science and Technology, Weixing Road No. 7089, Changchun, Jilin Province 130022, China;
School of Physics and Optoelectronic Technology, Dalian University of Science and Technology, Dalian, Liaoning Province 160024, China;
porosity; semiconductors; electrochemistry etching;
机译:通过CH_4 / H_2反应离子刻蚀在InP表面亚微米节距光栅中进行选择性刻蚀时,选择性对等离子体条件的依赖性
机译:两步栅极凹陷过程结合了选择性湿法蚀刻和数字湿法蚀刻,用于Inalas / InGaAs基于INP的垫圈
机译:两步栅凹工艺,用于基于InAl的InAl基HEMT的选择性湿法刻蚀和数字湿法刻蚀
机译:高选择性蚀刻比的超厚铜牺牲层选择性湿法蚀刻的有效解决方案
机译:微波辅助离子液体刻蚀调节InP纳米晶体的尺寸和表面
机译:n型InP中的孔:电化学孔蚀模型系统
机译:使用CBr4原位蚀刻的InGaas / Inp的纳米选择性区域生长
机译:选择性蚀刻硅选择性区域外延生长