Photosensitive sol-gel preparation and direct micro-patterning of c-oriented ZnO film

摘要

Using zinc acetate as the raw material, isopropanol as the solvent, and monoethanolamine as the stabilizer, photosensitive ZnO sol is prepared by chemical modification with the acetylacetone. Chelate rings of acetylacetone with zinc ions are formed in the ZnO sol and its corresponding gel films. Irradiation of the gel film by a UV lamp in air leads to the decomposition of the chelate ring. Using the photosensi-tivity of the gel films, ZnO gel patterns can be obtained by selective irradiation followed by leaching in organic solvents. After the patterned ZnO gel film is preheated at 500℃, and fired at 600℃, c-oriented ZnO patterned films are obtained.