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Resistivity of thin gold films on mica induced by electron-surface scattering: Application of quantitative scanning tunneling microscopy

机译:电子表面散射在云母上形成的金薄膜的电阻率:定量扫描隧道显微镜的应用

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We report a comparison between the resistivity measured on thin gold films deposited on mica, with predictions based upon classical theories of size effects (Drude's, Sondheimer's and Calecki's), as well as predictions based upon quantum theories of electron-surface scattering (the modified theory of Sheng, Xing and Wang, the theory of Tesanovic, Jaric and Maekawa, and that of Trivedi and Aschroft). From topographic images of the surface recorded with a Scanning Tunneling Microscope, we determined the rms roughness amplitude, δ and the lateral correlation length, ξ corresponding to a Gaussian representation of the average height-height autocorrelation function, describing the roughness of each sample in the scale of length set by the Fermi wave length. Using (δ, ξ) as input data, we present a rigorous comparison between resistivity data and predictions based upon the theory of Calecki as well as quantum theoretical predictions without adjustable parameters. The resistivity was measured on gold films of different thickness evaporated onto mica substrates, between 4 K and 300 K. The resistivity data covers the range 0.1 < x(T) < 6.8, for 4 K < T< 300 K, where x(T) is the ratio between film thickness and electron mean free path in the bulk at temperature T. We experimentally identify electron-surface and electron-phonon scattering as the microscopic electron scattering mechanisms giving rise to the macroscopic resistivity. The different theories are all capable of estimating the thin film resistivity to an accuracy better than 10%; however the mean free path and the resistivity characterizing the bulk turn out to depend on film thickness. Surprisingly, only the Sondheimer theory and its quantum version, the modified theory of Sheng, Xing and Wang, predict and increase in resistivity induced by size effects that seems consistent with published galvanomagnetic phenomena also arising from electron-surface scattering measured at low temperatures.
机译:我们报告了在云母上沉积的金薄膜上测得的电阻率与基于经典尺寸效应理论(德鲁德,桑德海默氏和卡莱克基理论)的预测以及基于电子表面散射量子理论的预测(改进的理论)之间的比较。 (胜,兴和王),Tesanovic,Jaric和Maekawa的理论,以及Trivedi和Aschroft的理论)。根据用扫描隧道显微镜记录的表面形貌图,我们确定了均方根粗糙度幅值δ和横向相关长度ξ,其对应于平均高度-高度自相关函数的高斯表示,描述了样品中每个样品的粗糙度费米波长设定的长度比例。使用(δ,ξ)作为输入数据,我们基于Calecki理论以及没有可调参数的量子理论预测,对电阻率数据和预测值进行了严格的比较。在4 K至300 K之间的云母基底上蒸镀了不同厚度的金膜,测量了电阻率。对于4 K

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