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首页> 外文期刊>Applied Surface Science >RF characteristic of MESFET on H-terminated DC arc jet CVD diamond film
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RF characteristic of MESFET on H-terminated DC arc jet CVD diamond film

机译:MESFET在H端直流电弧喷射CVD金刚石薄膜上的RF特性

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摘要

Diamond has been considered to be a potential material for high-frequency and high-power electronic devices due to the excellent electrical properties. In this paper, we reported the radio frequency (RF) characteristic of metal-semiconductor field effect transistor (MESFET) on polycrystalline diamond films prepared by direct current (DC) arc jet chemical vapor deposition (CVD). First, 4 in polycrystalline diamond films were deposited by DC arc jet CVD in gas recycling mode with the deposition rate of 14 μm/h. Then the polished diamond films were treated by microwave hydrogen plasma and the 0.2 μm-gate-length MESFET was fabricated by using Au mask photolithography and electron beam (EB) lithography. The surface conductivity of the H-terminated diamond film and DC and RF performances of the MESFET were characterized. The results demonstrate that, the carrier mobility of 24.6 cm~2/Vs and the carrier density of 1.096 × 10~(13) cm~(-2) are obtained on the surface of H-terminated diamond film. The FET shows the maximum transition frequency (fa) of 5 GHz and the maximum oscillation frequency (f_(max)) of 6 GHz at V_(GS) = -0.5 V and V_(DS) = -8 V, which indicates that H-terminated DC arc jet CVD polycrystalline diamond is suitable for the development of high frequency devices.
机译:由于出色的电性能,金刚石被认为是高频和大功率电子设备的潜在材料。在本文中,我们报道了通过直流(DC)电弧喷射化学气相沉积(CVD)制备的多晶金刚石薄膜上的金属半导体场效应晶体管(MESFET)的射频(RF)特性。首先,在气体再循环模式下通过DC电弧喷射CVD沉积4英寸的多晶金刚石膜,沉积速率为14μm/ h。然后,通过微波氢等离子体处理抛光的金刚石膜,并使用金掩模光刻和电子束(EB)光刻技术制造了0.2μm栅长的MESFET。表征了H端金刚石薄膜的表面电导率以及MESFET的DC和RF性能。结果表明,在氢封端的金刚石薄膜表面获得了24.6 cm〜2 / Vs的载流子迁移率和1.096×10〜(13)cm〜(-2)的载流子密度。 FET在V_(GS)= -0.5 V和V_(DS)= -8 V时显示5 GHz的最大过渡频率(fa)和6 GHz的最大振荡频率(f_(max)),这表明H端接的直流电弧喷射CVD多晶金刚石适用于开发高频器件。

著录项

  • 来源
    《Applied Surface Science》 |2013年第1期|798-803|共6页
  • 作者单位

    School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, PR China;

    School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, PR China;

    School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, PR China;

    School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, PR China;

    School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, PR China;

    School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, PR China;

    School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, PR China;

    Science and Technology on ASIC Laboratory, Hebei Semiconductor Research Institute, Shi Jia Zhuang 050051, PR China;

    Science and Technology on ASIC Laboratory, Hebei Semiconductor Research Institute, Shi Jia Zhuang 050051, PR China;

    Institute of Laser, Academy of Science of Hebei Province, Shijia Zhuang 050000, PR China;

    School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, PR China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    DC arc jet CVD; RF characteristic; Maximum transition frequency; H-terminated diamond; Maximum oscillation frequency; MESFET;

    机译:直流电弧喷射CVD;射频特性;最大过渡频率;H端钻石;最大振荡频率;场效应管;

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