Radiation absorber comprising a CVD diamond film having special surface characteristics

摘要

A radiation absorber comprising a CVD diamond film (16) (24) having at least one of the following characteristics: (a) a surface (18) adapted to be exposed to the radiation and having a roughened or patterned profile so as to trap incident radiation by multiple reflections; (b) a surface (26), bulk texture and grain size such that it is highly absorbent to the radiation by virtue of internal scatterings and multiple reflections. In (a) the diamond film will replicate the surface of the substrate on which it is deposited. The substrate may thereafter be removed, for example, by chemical etching. The substrate may be silicon, silicon nitride, tungsten carbide, sialon, silicon carbide, a diamond compact, molybdenum, copper, titanium, or tungsten. IMAGE