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Electrochromism and photocatalysis in dendrite structured Ti:WO3 thin films grown by sputtering

机译:溅射生长的枝晶结构Ti:WO3薄膜的电致变色和光催化作用

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Titanium doped tungsten oxide (Ti:WO3) thin films with dendrite surface structures were grown by co-sputtering titanium and tungsten in Ar + O-2 atmosphere. Ti:WO3 thin films were deposited at oxygen flow rates corresponding to pressures in the range 1.0 x 10(-3)-5.0 x 10(-3) mbar. Argon flow rate and sputtering power densities for titanium (2 W/cm(2)) and tungsten (3 W/cm(2)) were kept constant. Ti:WO3 films deposited at an oxygen pressure of 5 x 10-3 mbar are found to be better electrochromic and photocatalytic. They have high optical modulation (80% at), lambda = 550 nm), coloration efficiency (60 cm(2)/C at), lambda = 550 nm), electron/ion storage and removal capacity (Qc: -22.01 mC/cm(2), Qa: 17.72 mC/cm(2)), reversibility (80%) and methylene blue decomposition rate (-1.38 mu mol/ld). The combined effects of titanium doping, dendrite surface structures and porosity leads to significant enhancement in the electrochromic and photocatalytic properties of Ti:WO3 films. (C) 2015 Published by Elsevier B.V.
机译:通过在Ar + O-2气氛中共溅射钛和钨来生长具有枝晶表面结构的掺钛氧化钨(Ti:WO3)薄膜。 Ti:WO3薄膜以对应于1.0 x 10(-3)-5.0 x 10(-3)mbar范围内的压力的氧气流速沉积。钛(2 W / cm(2))和钨(3 W / cm(2))的氩气流速和溅射功率密度保持恒定。发现在5 x 10-3 mbar的氧气压力下沉积的Ti:WO3膜具有更好的电致变色和光催化性能。它们具有高的光调制(80%at,lambda = 550 nm),着色效率(60 cm(2)/ C at),lambda = 550 nm),电子/离子存储和去除能力(Qc:-22.01 mC / cm(2),Qa:17.72 mC / cm(2)),可逆性(80%)和亚甲基蓝分解速率(-1.38μmol / ld)。钛掺杂,枝晶表面结构和孔隙率的综合作用导致Ti:WO3薄膜的电致变色和光催化性能显着提高。 (C)2015由Elsevier B.V.发布

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