首页> 外文期刊>IEEE Transactions on Applied Superconductivity >Improved structural properties and surface morphology of Nd1+xBa2-xCu3O7-δ thin filmsdeposited by d.c. magnetron sputtering
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Improved structural properties and surface morphology of Nd1+xBa2-xCu3O7-δ thin filmsdeposited by d.c. magnetron sputtering

机译:d.c.沉积的Nd1 +xBa2-xCu3O7-δ薄膜的改善的结构性能和表面形态磁控溅射

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We report the fabrication of very smooth NdBCO thin films deposited by d.c. magnetron sputtering using Nd rich target (EDX composition Nd1.12Ba1.88Cu3O7-δ). Films characterized by critical temperature (R=0) higher than 90 K and maximum roughness lower than 2-3 nm on large areas are routinely obtained on SrTiO3 non-vicinal substrates. STM studies performed in situ in UHV environment, show a 2D nucleation mechanism of the growth preserved up to a thickness higher than 100 nm. This is in contrast to the common observation of screw dislocations starting from 10-12 nm in c-axis ReBCO thin films, that gives rise to an increase of the roughness with thickness. We compare the growth modes, the superconducting, and the structural properties of our NdBCO thin films deposited by d.c. magnetron sputtering from stoichiometric and Nd-rich targets, on different kind of substrates. The experimental results are discussed in the framework of the role of Nd/Ba substitution in the properties of Nd1+xBa2-xCu3O7-δ thin films
机译:我们报告了由dc沉积的非常光滑的NdBCO薄膜的制造。使用富Nd靶(EDX组成Nd1.12Ba1.88Cu3O7-δ)进行磁控溅射。通常在SrTiO3非邻近基材上获得具有高于90 K的临界温度(R = 0)和最大粗糙度小于2-3 nm的薄膜。在UHV环境中原位进行的STM研究表明,在厚度大于100 nm的情况下,生长的二维成核机制得以保留。这与在c轴ReBCO薄膜中从10-12 nm开始的螺距位错的常见观察结果相反,螺距位错导致粗糙度随厚度增加。我们比较了dc沉积的NdBCO薄膜的生长模式,超导和结构特性。从化学计量的和富Nd的靶材在不同类型的基板上进行磁控溅射。在Nd / Ba替代在Nd1 +xBa2-xCu3O7-δ薄膜的性能中的作用框架内讨论了实验结果

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