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Properties of NbTiN thin films prepared by reactive DC magnetronsputtering

机译:反应性直流磁控溅射制备NbTiN薄膜的性能

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We have prepared Nb1-xTixN (NbTiN) thin films by reactive dc magnetron sputtering without intentional heating. Superconducting properties were strongly related to sputtering conditions. Lattice parameters of NbTiN films approached that of bulk NbTiN on decreasing the N2 mole fraction in Ar and N2 sputtering gas mixture. The film orientation was also strongly related to the sputtering conditions such as gas pressure. NbN thin films could grow epitaxially on MgO(100) substrates and showed very smooth surfaces. We found that smooth NbTiN films could be obtained on MgO(100) substrates with an epitaxially grown NbN template layer
机译:我们通过无意识加热的反应性直流磁控溅射制备了Nb1-xTixN(NbTiN)薄膜。超导性能与溅射条件密切相关。 NbTiN薄膜的晶格参数随着Ar和N2溅射气体混合物中N2摩尔分数的降低而接近块状NbTiN。膜取向还与溅射条件如气压密切相关。 NbN薄膜可以在MgO(100)衬底上外延生长,并显示非常光滑的表面。我们发现可以在具有外延生长的NbN模板层的MgO(100)基板上获得光滑的NbTiN膜

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