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首页> 外文期刊>IEEE Transactions on Applied Superconductivity >Control of porosity and composition in large-area YBCO films to achieve micrometer thickness and high J/sub c/ on sapphire substrates
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Control of porosity and composition in large-area YBCO films to achieve micrometer thickness and high J/sub c/ on sapphire substrates

机译:控制大面积YBCO膜的孔隙率和组成,以实现微米厚度和蓝宝石衬底上的高J / sub c /

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摘要

Relatively thick YBCO thin films (thickness d>0.5 /spl mu/m) ideal for fault current limiter as well as microwave applications have been successfully prepared by large-area pulsed laser deposition (PLD) on CeO/sub 2/-buffered sapphire substrates. The attainment of an unusually high film thickness (up to 2.0 /spl mu/m) without microcracking is attributed in part to the presence of pores correlated with yttrium-rich composition in the films. The effect of using YBCO targets with varied Y:Ba:Cu ratios on film porosity and surface morphology was investigated in detail. Using the optimum target composition, uniform critical current densities (J/sub c/) ranging from /spl sim/4.5 MA/cm/sup 2/ at d/spl sim/0.23 /spl mu/m to /spl sim/1.75 MA/cm/sup 2/ at d/spl sim/0.6 /spl mu/m have been achieved. Characterization of a film with d/spl sim/0.5 /spl mu/m showed low microwave surface resistance values [R/sub s/(77.3 K)/spl ap/2.09 m/spl Omega/ and R/sub s/(20 K)/spl ap/227 /spl mu//spl Omega/ at 22 GHz] comparable to the best YBCO films reported by other studies.
机译:通过在CeO / sub 2 /缓冲蓝宝石衬底上进行大面积脉冲激光沉积(PLD)成功地制备了相对较厚的YBCO薄膜(厚度d> 0.5 / spl mu / m),非常适合故障电流限制器以及微波应用。在没有微裂纹的情况下获得异常高的膜厚度(高达2.0 / spl mu / m)部分归因于膜中存在与富钇组成相关的孔。详细研究了使用Y:Ba:Cu比率不同的YBCO靶对薄膜孔隙率和表面形态的影响。使用最佳目标成分,均匀的临界电流密度(J / sub c /)在d / spl sim / 0.23 / spl mu / m时的/ spl sim / 4.5 MA / cm / sup 2 /到/ spl sim / 1.75 MA的范围已达到d / spl sim / 0.6 / spl mu / m的/ cm / sup 2 /。 d / spl sim / 0.5 / spl mu / m的薄膜表征显示出较低的微波表面电阻值[R / sub s /(77.3 K)/ spl ap / 2.09 m / spl Omega /和R / sub s /(20 K)/ spl ap / 227 / spl mu // spl Omega /(在22 GHz下),可与其他研究报告的最佳YBCO膜相媲美。

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