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Effects of the Size of the Doped SiC Nanoparticles on the Critical Current Density of the Ti-Sheathed MgB$_{2}$ Superconducting Wires

机译:掺杂的SiC纳米粒子的尺寸对Ti包覆MgB $ _ {2} $超导线的临界电流密度的影响

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The effects of the grain size of the doped SiC nanoparticles on the critical current density $(J_{rm c})$ of the Ti-sheathed $hbox{MgB}_{2}$ superconducting wires were studied. The concentration of the SiC dopant was 10% and the sizes of the SiC particles were 20 nm, 45 nm, and 123 nm. Contrary to the $J_{rm c}$ results reported on the SiC-doped Fe-sheathed $hbox{MgB}_{2}$ wires, we found that the $J_{rm c}$ for the Ti-sheathed $hbox{MgB}_{2}$ wires decreased with the size of the SiC particles. We also found that the $J_{rm c}$ is greater than that of the undoped $hbox{MgB}_{2}$ wires only for the wires with 123 nm SiC size. This unusual dependence of $J_{rm c}$ on the size of the SiC dopant is discussed in association with the results from the magnetization, electrical resistivity, x-ray diffraction, and transmission electron microscopy measurements.
机译:研究了掺杂的SiC纳米颗粒的粒径对Ti护套$ hbox {MgB} _ {2} $超导线的临界电流密度$(J_ {rm c})$的影响。 SiC掺杂剂的浓度为10%,并且SiC颗粒的尺寸为20nm,45nm和123nm。与SiC掺杂的铁皮$ hbox {MgB} _ {2} $导线报道的$ J_ {rm c} $结果相反,我们发现Ti护套$ hbox的$ J_ {rm c} $ {MgB} _ {2} $导线随着SiC颗粒尺寸的减小而减小。我们还发现,对于具有123 nm SiC尺寸的导线,$ J_ {rm c} $大于未掺杂的$ hbox {MgB} _ {2} $导线。结合磁化,电阻率,X射线衍射和透射电子显微镜测量的结果,讨论了$ J_ {rm c} $对SiC掺杂剂尺寸的这种不寻常的依赖性。

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