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Simultaneous measurement of the piezoelectric and dielectric response of nanoscale ferroelectric capacitors by an atomic force microscopy based approach

机译:基于原子力显微镜的方法同时测量纳米级铁电电容器的压电和介电响应

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We present a sensitive method to simultaneously acquire the C(V) characteristics and piezoresponse of sub-micron size ferroelectric capacitors using an Atomic Force Microscope (AFM). Model Pt/(La_(0.5),Sr_(0.5))CoO_3/PbZr_(0.4)Ti_(0.6) O_3/(La_(0.5),Sr_(0.5))CoO_3/La:SrTiO_3/Si nanocapacitors were fabricated by focused ion beam milling from 100μm~2 down to 0.04 μm~2. With this AFM based capacitance measurement technique we show clear "double-humped" C(V) for all sizes with no significant change in the peak value of the ε_r down to capacitors with the smallest area of 0.04 μm~2. The smallest capacitance measured is only of the order a few femtofarads, demonstrating the high sensitivity of the technique. Simultaneously, the piezoelectric response is recorded for each measurement, thus the technique facilitates simultaneous piezoresponse and dielectric characterization of ferroelectric memory devices.
机译:我们提出一种灵敏的方法,同时使用原子力显微镜(AFM)来获取亚微米尺寸铁电电容器的C(V)特性和压电响应。通过聚焦离子制备了Pt /(La_(0.5),Sr_(0.5))CoO_3 / PbZr_(0.4)Ti_(0.6)O_3 /(La_(0.5),Sr_(0.5))CoO_3 / La:SrTiO_3 / Si纳米电容器光束铣削从100μm〜2降至0.04μm〜2。通过这种基于AFM的电容测量技术,我们可以看到所有尺寸的清晰“双峰” C(V),而直到最小面积为0.04μm〜2的电容器,ε_r的峰值均无明显变化。测得的最小电容仅为几飞法拉数量级,证明了该技术的高灵敏度。同时,每次测量都会记录压电响应,因此该技术有助于同时进行铁电存储器件的压电响应和介电特性表征。

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